Particle Coating & Surface Modification
Uniform thin-film deposition on powder particles is a key method to improve material performance for battery materials, catalyst supports and wear-resistant powders.
Industry Challenges
Traditional coating methods suffer from poor uniformity and large batch-to-batch variation.
FBCVD Solution
FBCVD reactors achieve particle-level uniform coating, with film thickness and structure controlled by temperature, gas flow and residence time.
Particle-level Uniformity
Every particle is fluidized; coating without dead zones.
Controllable Films
Thickness, composition and structure precisely tuned.
Multiple Systems
Carbon, silicon, oxide and other deposition systems.
Lab to Production
Validate in lab scale, scale up seamlessly.
Related Products
SR-P Production-scale FBCVD Reactor
Continuous FBCVD reactor for large-scale Si-C anode and CNT production with large batch capacity, uniform coating and continuous feeding.
View Details →SR-M Pilot-scale FBCVD Reactor
Pilot FBCVD reactor with wide adjustable parameter ranges for process validation and scale-up, bridging lab and production.
View Details →SR-L Lab-scale FBCVD Reactor
Bench-top lab FBCVD reactor for catalyst evaluation, deposition process exploration and small-batch tests.
View Details →FBCVD Supporting Systems (Gas/Tail-gas/Temp.)
Gas supply, tail gas treatment and temperature control systems for FBCVD reactors, ensuring safe, clean and stable operation.
View Details →Need fluidized bed reactor selection advice or process solutions? Contact us anytime.
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