Powder Atomic Layer Deposition (FB-ALD) & Ultra-Uniform Nano-Coating
Powder atomic layer deposition (FB-ALD) solution. Powder is fluidized and precursors are deposited alternately for atomic-level uniform coating, applicable to catalysts, battery materials, precious metal loading and other high-end powders.
Industry Challenges
Conventional coating methods offer poor thickness control and uniformity; micro/nano powders and high-aspect-ratio particles are hard to coat uniformly, directly affecting product consistency.
FBCVD Solution
Based on fluidized-bed FB-ALD, powder in fluidized state undergoes alternate precursor pulse deposition for atomic-level thickness-controlled, highly isotropic coating. Provides lab-scale to production-scale equipment and process validation.
Atomic-level uniform
Powder fluidization with alternate precursor deposition for atomic-level thickness control.
Fluidized-bed platform
Applicable to D50=2-1000 μm powders with efficient gas-solid contact.
Multiple precursors
Adapts to various deposition systems and target materials.
Scale-up
Lab-scale to production-scale for production line scale-up.
Related Products
SR-L Lab-scale FBCVD Reactor
Bench-top lab FBCVD reactor for catalyst evaluation, deposition process exploration and small-batch tests.
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SR-M Pilot-scale FBCVD Reactor
Pilot FBCVD reactor with wide adjustable parameter ranges for process validation and scale-up, bridging lab and production.
View Details →SR-P Production-scale FBCVD Reactor
Continuous FBCVD reactor for large-scale Si-C anode and CNT production with large batch capacity, uniform coating and continuous feeding.
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FBCVD Supporting Systems (Gas/Tail-gas/Temp.)
Gas supply, tail gas treatment and temperature control systems for FBCVD reactors, ensuring safe, clean and stable operation.
View Details →Need fluidized bed reactor selection advice or process solutions? Contact us anytime.
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